Laboratory of Integrated Biomedical Micro/Nanotechnology & Applications (LIBNA)
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A Simple Process to Produce High Quality Silicon Surface Prior to Selective Epitaxial Growth

Rashid Bashir W Mckweon A Kabir

Published in IEEE Electron Device Letters

Back Gated Buried Oxide MOSFETs in a High Voltage Bipolar Technology for Bonded Oxide/SOI Interface Characterization

Rashid Bashir F Wang W Yindepool J De Santis J Mcgregor

Published in IEEE Electron Device Letters

PLATOP-A Novel Planarized Trench Isolation and Field Oxide Formation Using Poly-Silicon

Rashid Bashir F Hebert

Published in IEEE Electron Device Letters

A Poly-Silicon Contacted Sub-Collector BJT for a 3-Dimensional BiCMOS Process

Rashid Bashir S Venkatesan G Neudeck J Denton

Published in IEEE Electron Device Letters

Degradation of Insulators in the Silicon Selective Epitaxial Growth Ambient

Rashid Bashir Kim, S Qadri, N Jin, D Neudeck, G Denton, J Yeric, G Wu, K Tasch, A

Published in IEEE Electron Device Letters

The degradation of various insulators in Silicon Selective Epitaxial Growth (SEG) ambient was studied. The insulators studied were thermal oxide, reoxidized nitride/oxide stack, poly-oxide, and nitrided oxide. Breakdown electric fields of MIS capacitors were measured and yields were calculated before and after the insulators were exposed to Silicon...

Precision Electrical Trimming of Poly-SiGe Resistors

J Babcock P Francis Rashid Bashir A Kabir T Dhayahude W Yindeepol S Prasad A Kalnitsky M Thomas H Haggag ...

Published in IEEE Electron Device Letters

Elimination of the Sidewall Defects in Selective Epitaxial Growth (SEG) of Silicon for a Dielectric Isolation Technology...

J Sherman G Neudeck J Denton Rashid Bashir W Fultz

Published in IEEE Electron Device Letters

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